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Dual-stage nanopositioning for high-speed scanning probe microscopy


T. Tuma, W. Haeberle, H. Rothuizen, J. Lygeros, A. Pantazi, A. Sebastian

Conference on Decision and Control (CDC), Maui, Hawaii, USA (Dec 10-13, 2012), pp. 5079-5084

A novel positioning concept for high-speed scanning probe microscopy is presented in which a dual-stage nanopositioner is used for precise positioning over large areas at high speeds. The nanopositioner combines a low-bandwidth, large-range commercial scanner with a custom-designed highspeed scanner for short-range positioning. We present the mechanical design, finite element simulations and experimental characterization of the high-speed scanner, showing exceptionally clean dynamics, high linearity and large actuation bandwidth. The scanner is equipped with a magneto-resistive position sensing scheme that provides subnanometer resolution over a large bandwidth. Advanced model-based feedback controllers are designed according to a newly developed control design architecture with direct shaping of the closed-loop noise sensitivity and experimental results are presented in which the dual-stage system is used for high-speed imaging in a custombuilt atomic force microscope.


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% Autogenerated BibTeX entry
@InProceedings { TumEtal:2013:IFA_4643,
    author={T. Tuma and W. Haeberle and H. Rothuizen and J. Lygeros and A. Pantazi and A. Sebastian},
    title={{Dual-stage nanopositioning for high-speed scanning probe
    booktitle={Conference on Decision and Control (CDC)},
    address={Maui, Hawaii, USA (Dec 10-13, 2012)},
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