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Metrology, Modeling, and Control for Semiconductor Manufacturing

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Abstract:
We begin by discussing the objectives, components, and history of our research program at Berkeley. We then describe our efforts in developing metrology for lithography and plasma etching applications. These include temperature, etch-rate, and thermal flux sensors. Our sensors are fully self-contained with on board power, communications, and signal processing electronics. They externally resemble standard silicon wafers compatible with standard cassette-to-cassette robotics, and thus require no equipment modification for deployment. The sensors we have developed offer very fine spatial and time resolution, making them suitable for process optimization and control. We describe our efforts in using these sensors for feedback control of the photolithography process. We then discuss our initial work in developing a new class of sensors based on electrical impedance tomography. Finally, we describe our efforts at commercializing this technology.

Type of Seminar:
Public Seminar
Speaker:
Prof. Kameshwar Poolla
University of California, Berkeley and Chief Scientist, OnWafer Technologies, Dublin, California
Date/Time:
Nov 09, 2005   17:15
Location:

ETH Zentrum, Gloriastrasse 35, Building ETZ, Room E6
Contact Person:

Prof. M. Morari
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Biographical Sketch:
Kameshwar Poolla received the Bachelor of Technology degree from the Indian Institute of Technology, Bombay in 1980, and the Ph.D. degree from the University of Florida, Gainesville in 1984. He has served on the faculty of the Department of Electrical and Computer Engineering at the University of Illinois, Urbana from 1984 to 1991. Since then, he has been with the University of California, Berkeley where he is a Professor of Mechanical Engineering and Electrical Engineering & Computer Sciences. He has also held visiting appointments at Honeywell, McGill University, M.I.T., Michigan, and Columbia, and has worked as a Field Engineer with Schlumberger on oilrigs in West Africa. In 1999, he co-founded OnWafer Technologies which offers metrology based yield enhancement solutions for the semiconductor industry, where he currently serves as Chief Scientist. Professor Poolla has been awarded a 1988 NSF Presidential Young Investigator Award, the 1993 Hugo Schuck Best Paper Prize (with Profs. Khargonekar, Tikku, Nagpal, and Krause), the 1994 Donald P. Eckman Award, and the 1998 Distinguished Teaching Award of the University of California. His research interests include Micro-Sensors, System Identification, Robust Control, Semiconductor Manufacturing, and Medical Imaging.